Novel Laser-Driven Microplasma Extreme Ultraviolet Source(No. 0158)

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A novel extreme ultraviolet (EUV) system provides a power efficient and cost effective solution for nanoscale imaging applications.

The EUV market will see continued growth in the coming years owning to its increasing applications in nanoscale imaging in the semiconductor industry, attosecond pulse generation for research, and photoemission spectroscopy. The EUV market is predicted to grow at a CAGR of 9.2% up to 2025. However, many of these currently known EUV systems suffer from problems such as slow image processing times, low output power, and are expensive, bulky, and dangerous. Here we present an ideal EUV source developed by a group of researchers led by Prof. Keshav Dani, that has high power efficiency and overcomes these problems.


Lead Researcher:
Keshav Dani

Faculty of Femtosecond Spectroscopy Unit


  • EUV nanoscale imaging
  • Attosecond pulse generation
  • Photoemission spectroscopy



  • Power efficient EUV generation
  • Fast imaging processing times
  • Cheap and compact




This technology is a laser-driven extreme EUV radiation source. By guiding a low pulse energy femtosecond laser beam on a gas target in a novel way, one can generate a microplasma used as a wavelength converter to generate EUV radiation. This technology provides a power efficient EUV generation and fast image processing speed. The low power requirement provides compatibility with widely spread, compact and cheaper low power femtosecond lasers. Additionally, proof of concept research is ongoing and focuses on industrial applications in the semiconductor industry.


Media Coverage and Presentations

 JST Technology Showcase Presentation (JP Only)

 JST Technology Showcase Presentation Slides (JP Only)



  Graham Garner
Technology Licensing Section